Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
From its inception Eclipse was mainly designed to be a tooling platform, but with Version 3.0, Eclipse is now evolving toward a Rich Client Platform (RCP). This change, driven by the open-source community, brought a whole set of new requirements and challenges for the Eclipse platform, such as dynamic plug-in management, services, security, and improved performance. This paper describes the path from the proprietary Eclipse 2.1 runtime to the new Eclipse 3.0 runtime based on OSGi™ specifications. It details the motivation for such a change and discusses the challenges this change presented. © Copyright 2005 by International Business Machines Corporation.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Limin Hu
IEEE/ACM Transactions on Networking
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Renu Tewari, Richard P. King, et al.
IS&T/SPIE Electronic Imaging 1996