Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
No abstract available.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
M.J. Slattery, Joan L. Mitchell
IBM J. Res. Dev
Yun Mao, Hani Jamjoom, et al.
CoNEXT 2006
Maciel Zortea, Miguel Paredes, et al.
IGARSS 2021