ReviewArF excimer laser resists based on fluoroalcoholHiroshi Ito, H.D. Truong, et al.Polymers for Advanced Technologies
Conference paperDissolution/swelling behavior of cycloolefin polymers in aqueous baseHiroshi Ito, R.D. Allen, et al.Microlithography 2000
Conference paperPolymer platform dependent characteristics of 193 nm photoresistsJuliann Opitz, R.D. Allen, et al.SPIE Advances in Resist Technology and Processing 1999
PaperNovel photoresist design based on electrophilic aromatic substitutionB. Reck, R.D. Allen, et al.Polymer Engineering & Science