Synthesis and lithographic performance of photosensitive poly(phenylquinoxaline)s and related structures

Abstract

A possible alternative for photodefinition of high temperature polymers is to use a chemical amplification scheme (CA), which has proven to be an excellent lithographic approach for integrated photogeneration of a catalytic amount of a strong Bronsted acid which reacts in a subsequent thermal step with acid sensitive groups in the photoresists. In the case where the photoacid catalyzes the cleavage of t-butyloxycarbonyl (BOC) groups from poly(hydroxystyrene), the high contrast obtained is due to the large solubility change which occurs with the conversion of BOC to solubility change which occurs with the conversion of BOC to hydroxyl groups.