About cookies on this site Our websites require some cookies to function properly (required). In addition, other cookies may be used with your consent to analyze site usage, improve the user experience and for advertising. For more information, please review your options. By visiting our website, you agree to our processing of information as described in IBM’sprivacy statement. To provide a smooth navigation, your cookie preferences will be shared across the IBM web domains listed here.
Paper
Surface loss coefficients for the silyl radical
Abstract
Direct loss measurements for the heterogeneous reaction of the silyl radical, SiH3, obtained in a discharge flow reactor with mass spectrometric detection, are reported. From these measurements and the calculated gas-surface collision frequency, total surface loss coefficients, β, are determined for silyl on two different surfaces, one coated with a growing silicon-containing film and the other coated with Halocarbon wax. © 1993 American Chemical Society.