Frank R. Libsch, Takatoshi Tsujimura
Active Matrix Liquid Crystal Displays Technology and Applications 1997
Films of CdS typically 0.3 μm thick, grown on glass substrates at 350 °C, 400 °C and 450 °C by chemical spray pyrolysis (CSP) show n-type resitivities of 102 Ω cm at 350 °C and > 105 Ω cm at 400 °C and 450 °C respectively. This resistivity increase with temperature is attributed to decreasing amounts of chlorine remaining in these films as a byproduct of the CSP process and is consistent with the known n-type dopant behavior of chlorine in this system. © 1995.
Frank R. Libsch, Takatoshi Tsujimura
Active Matrix Liquid Crystal Displays Technology and Applications 1997
S. Cohen, J.C. Liu, et al.
MRS Spring Meeting 1999
P. Martensson, R.M. Feenstra
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering