Conference paper
Learning Reduced Order Dynamics via Geometric Representations
Imran Nasim, Melanie Weber
SCML 2024
Conference paper
Statistical limitations of printing 50 and 80 nm contact holes by EUV lithography
Abstract
No abstract available.
Related
M.A. Lutz, R.M. Feenstra, et al.
Surface Science
Dipanjan Gope, Albert E. Ruehli, et al.
IEEE T-MTT
Heinz Schmid, Hans Biebuyck, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures