Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Conference paper
10 Dec 2003

Statistical limitations of printing 50 and 80 nm contact holes by EUV lithography

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Abstract

No abstract available.

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Date

10 Dec 2003

Publication

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Authors

  • G.M. Gallatin
  • F.A. Houle
  • J.L. Cobb
IBM-affiliated at time of publication

Topics

  • Physical Sciences

Resources

  • Publication

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