Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
This paper introduces stabilization techniques for intrinsically unstable, high accuracy rational approximation methods for strongly continuous semigroup. The methods not only stabilize the approximations, but improve their speed of convergence by a magnitude of up to 1/2. © 2007 Elsevier Inc. All rights reserved.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
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BMC Bioinformatics
Imran Nasim, Michael E. Henderson
Mathematics
J.P. Locquet, J. Perret, et al.
SPIE Optical Science, Engineering, and Instrumentation 1998