Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
For many years, defence intelligence and government organizations have been using highly specialized security technologies to control access to sensitive information and to protect the integrity of information. In the face of increasing insider trading and industrial espionage, this paper describes how business can exploit technology that has previously been available only to spooks and is now available in open systems products.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
S. Sattanathan, N.C. Narendra, et al.
CONTEXT 2005
Michael D. Moffitt
ICCAD 2009
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009