Modeling polarization for Hyper-NA lithography tools and masks
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SPIE Advanced Lithography 2007
We present an algorithm which finds a minimum vertex cover in a graph G(V, E) in time O(|V|+( a k)2 k 3), where for connected graphs G the parameter a is defined as the minimum number of edges that must be added to a tree to produce G, and k is the maximum a over all biconnected components of the graph. The algorithm combines two main approaches for coping with NP-completeness, and thereby achieves better running time than algorithms using only one of these approaches. © 1985.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
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Photomask and Next-Generation Lithography Mask Technology 2004
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Journal of Computer and System Sciences
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