Physical Review Letters

Paper

23 Mar 1987

Sette et al. respond

View publication

Abstract

No abstract available.

Related

Paper

Extended x-ray absorption fine structure studies by soft x-ray fluorescence detection

Paper

Interhalogen Plasma Chemistries for the Etching of NiMnSb

Paper

Corrosion-free dry etch patterning of magnetic random access memory stacks: Effects of ultraviolet illumination

Paper

Parametric study of NiFe and NiFeCo high density plasma etching using CO/NH₃

View all publications