Conference paperEffect of inert gas additive on Cl2-based inductively coupled plasma etching of NiFe and NiFeCoK.B. Jung, H. Cho, et al.Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperParametric study of NiFe and NiFeCo high density plasma etching using CO/NH3K.B. Jung, J. Hong, et al.JES
Conference paperRelative merits of [formula omitted] and [formula omitted] plasma chemistries for dry etching of magnetic random access memory device elementsK.B. Jung, H. Cho, et al.Journal of Applied Physics
