Conference paperRelative merits of [formula omitted] and [formula omitted] plasma chemistries for dry etching of magnetic random access memory device elementsK.B. Jung, H. Cho, et al.Journal of Applied Physics
PaperCarbon K-shell excitation of gaseous and condensed cyclic hydrocarbons: C3H6, C4H8, C5H 8, C5H10, C6H10, C 6H12, and C8H8A.P. Hitchcock, D.C. Newbury, et al.The Journal of Chemical Physics
PaperInductively coupled plasma etching of CoFeB, CoZr, CoSm and FeMn thin films in interhalogen mixturesH. Cho, K.B. Jung, et al.Materials Science and Engineering B: Solid-State Materials for Advanced Technology
