Conference paper
Product burn-in stress impacts on SRAM array performance
Li Wang, Qiuyi Ye, et al.
IRPS 2007
The fundamental surface chemistry underlying selectivity in copper chemical vapor deposition (CVD) from COD-Cu-hfac and Cu(hfac)2 has been determined. Both electronic and chemistry contributions strongly influence the precursor reactivity on oxide as compared to metal surfaces. These results have important implications regarding the role of surface preparation and cleaning for initiating and maintaining selective deposition.
Li Wang, Qiuyi Ye, et al.
IRPS 2007
Ruud A. Haring, Michael Liehr
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Susan L. Cohen, Michael Liehr, et al.
Applied Physics Letters
C. Michael Greenlief, Michael Liehr
Applied Physics Letters