Publication
Applied Physics Letters
Paper

Reduction of ion sputtering yield by special surface microtopography

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Abstract

It is demonstrated that by covering a tungsten surface with tungsten needles, the sputtering coefficient for He ions is reduced by a factor of 3 to 100. Also, this metal surface does not blister under He bombardment to doses of 2.8×1019 He/cm2, although a similar polished W surface blisters at 1/30 this dose. Sputtering yields have been determined for both monoenergetic and distributed energy He ion beams, and the angular distribution of sputtered ions is reported.

Date

26 Aug 2008

Publication

Applied Physics Letters

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