Reduced hot-carrier reliability degradation of x-ray irradiated MOSFETs in a 0.25 μm CMOS technology with ultra-thin gate oxide

R.J. Gambino, N.R. Stemple, et al.

Journal of Physics and Chemistry of Solids

A. Ney, R. Rajaram, et al.

Journal of Magnetism and Magnetic Materials

Ronald Troutman

Synthetic Metals

Julian J. Hsieh

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films