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Publication
Integrated Ferroelectrics
Paper
Preparation of (Pb,La)TiO3 films by metal organic chemical vapor deposition with new lanthanum precursors
Abstract
Thin films of (Pb, La)TiO3 were grown with three new trialkylphosphine oxide adducts of lanthanum tris-tetramethylheptanedione with the general formula La(thd)3(RR′R″3PO)n where thd = tetramethylheptanedione, (CH3)3CCOCHCOC(CH3)3; R = R′ =R″ = CH3; R = R″ = CH3, R″ = C4H9; R = R′ = R″ = C4H9. The new precursors were compared with La(thd)3 and were evaluated for volatility, thermal stability, ease of transport and La incorporation into a (Pb, La)TiO3 film.