Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
The scaling of CMOS technology has progressed rapidly for three decades, but may soon come to an end because of power-dissipation constraints. The primary problem is static power dissipation, which is caused by leakage currents arising from quantum tunneling and thermal excitations. The details of these effects, along with other scaling issues, are discussed in the context of their dependence on application. On the basis of these considerations, the limits of CMOS scaling are estimated for various application scenarios.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Maciel Zortea, Miguel Paredes, et al.
IGARSS 2021
Charles H. Bennett, Aram W. Harrow, et al.
IEEE Trans. Inf. Theory
G. Ramalingam
Theoretical Computer Science