Polymethyl methacrylate resist sensitivity enhancement in x-ray lithography by in situ polymerization

Abstract

X-ray-induced grafting of acrylic acid to poly (methyl methacrylate) (PMMA) increases the resist sensitivity by at least three orders of magnitude. Scanning electron microscopy of grafted PMMA revealed micron and submicron features for dose levels as small as 0.1-1 mJ/cm2, thus demonstrating the possibility of using this technique for x-ray lithography.