Publication
Applied Physics Letters
Paper

Polymethyl methacrylate resist sensitivity enhancement in x-ray lithography by in situ polymerization

View publication

Abstract

X-ray-induced grafting of acrylic acid to poly (methyl methacrylate) (PMMA) increases the resist sensitivity by at least three orders of magnitude. Scanning electron microscopy of grafted PMMA revealed micron and submicron features for dose levels as small as 0.1-1 mJ/cm2, thus demonstrating the possibility of using this technique for x-ray lithography.

Date

01 Dec 1984

Publication

Applied Physics Letters

Authors

Share