R.D. Murphy, R.O. Watts
Journal of Low Temperature Physics
Plasma-induced surface segregation and oxidation of Fe in nickel-iron (NiFe) thin films have been investigated. Reactive species in an oxygen plasma are found to be the driving force for Fe surface segregation and oxidation. Mapping of the film optical density change as a function of plasma exposure conditions indicates that segregation and oxidation are accelerated dramatically by the presence of reactive radicals and ion bombardment. For plasma oxidation protection, tantalum is found to be a more effective capping layer than tantalum oxide. With a tantalum capping layer, NiFe films maintain their magnetic properties until the tantalum capping layer is completely oxidized.
R.D. Murphy, R.O. Watts
Journal of Low Temperature Physics
A.B. McLean, R.H. Williams
Journal of Physics C: Solid State Physics
Biancun Xie, Madhavan Swaminathan, et al.
EMC 2011
Julian J. Hsieh
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films