William G. Van der Sluys, Alfred P. Sattelberger, et al.
Polyhedron
Paper
Pitting of Sputtered Aluminum Alloy Thin Films
Abstract
A number of Al binary alloy thin films were studied over a range of composition up to 40% solute using a co-sputtering technique with the substrates at room temperature. These Al alloy films were tested in 0.1 M NaCl and found to have extraordinary pitting resistance. © 1989, The Electrochemical Society, Inc. All rights reserved.
Related
A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990
C.M. Brown, L. Cristofolini, et al.
Chemistry of Materials
Thomas E. Karis, C. Mark Seymour, et al.
Rheologica Acta