A. Reisman, M. Berkenblit, et al.
JES
Paper
Physical and chemical mechanisms in the ion-enhanced etching of silicon
Abstract
No abstract available.
Related
P.C. Pattnaik, D.M. Newns
Physical Review B
B.A. Hutchins, T.N. Rhodin, et al.
Surface Science
Conference paper
Compression for data archiving and backup revisited
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009