Photoablation experiments of thin polysilane‐films prepared by the Langmuir‐Blodgett‐Kuhn technique

Abstract

We give a brief survey of our recent research on polysilane Langmuir‐Blodgett‐Kuhn films. Surface‐plasmon experiments, IR and flourescence‐lifetime measurements have been performed to study the complex photophysical and photochemical processes in these materials following UV irradiation. Quenching effects of the polysilane backbone and their influence on the ablation‐kinetics are discussed. Copyright © 1991 Hüthig & Wepf Verlag