PaperPrioritizing a portfolio of information technology investment projectsIndranil R. Bardhan, Sugato Bagchi, et al.JMIS
Conference paperPerformance data on new tunable attenuating PSM for 193nm and 157nm lithographyHans Becker, Frank Schmidt, et al.Photomask and Next-Generation Lithography Mask Technology 2004
Conference paperModeling and simulating flash based solid-state disks for operating systemsKaoutar El Maghraoui, Gokul Kandiraju, et al.WOSP/SIPEW 2010
Conference paperSelf-assembling materials for lithographic patterning: Overview, status and moving forwardWilliam Hinsberg, Joy Cheng, et al.SPIE Advanced Lithography 2010
