Conference paper
PHOTOINITIATED INTERFACIAL CATIONIC POLYMERIZATION.
C.G. Willson, Anders Hult, et al.
ACS National Meeting 1984
Recent developments in applications of polymers as resists in microlithography are reviewed. Emphasis is placed on the advances in materials and processes associated with current photolithographic resists designed to extend the utility of photolithography into the submicrometer regime and to ensure continued dominance of photolithographic technology in commercial manufacture of integrated circuits.
C.G. Willson, Anders Hult, et al.
ACS National Meeting 1984
I. Teraoka, D. Jungbauer, et al.
Journal of Applied Physics
Jeff W. Labadie, Scott A. MacDonald, et al.
Journal of imaging science
G.M. Wallraff, R.D. Allen, et al.
ACS Spring 1991