Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Paper
Optimal universally stable interpolation
Abstract
We exhibit an interpolation process using rational functions which is stable - in the strict sense of Fejer - for all sets of nodes and is optimal, insofar as the degree of the interpolating rational function is concerned. The degree of approximation to continuous functions by this procedure is also determined. © R. Oldenbourg Verlag
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