Heng Cao, Haifeng Xi, et al.
WSC 2003
Paper
Optimal starting approximations for newton’s method
Abstract
No abstract available.
Related
Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Arnon Amir, Michael Lindenbaum
IEEE Transactions on Pattern Analysis and Machine Intelligence
Conference paper
Neave effect also occurs with Tausworthe sequences
Shu Tezuka
WSC 1991