Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
The BSMSn source is addressed in this study. It is shown that BSMSn is not successively refinable under the Hamming distortion measure, provided that n > 2.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
F. Odeh, I. Tadjbakhsh
Archive for Rational Mechanics and Analysis
J.P. Locquet, J. Perret, et al.
SPIE Optical Science, Engineering, and Instrumentation 1998
Leo Liberti, James Ostrowski
Journal of Global Optimization