Intensive optimization of masks and sources for 22nm lithography
Alan E. Rosenbluth, David O. Melville, et al.
SPIE Advanced Lithography 2009
We study the effect of the odd directed cycle inequalities in the description of the polytope associated with the p-median problem. We treat oriented graphs, i.e., if (u,v) is in the arc-set, then (v,u) is not in the arc-set. We characterize the oriented graphs for which the obvious linear relaxation together with the directed odd cycle inequalities describe the p-median polytope. This study has two parts: in this paper we treat triangle-free graphs, then in a second paper we use induction on the number of triangles to treat general oriented graphs.
Alan E. Rosenbluth, David O. Melville, et al.
SPIE Advanced Lithography 2009
Francisco Barahona, Markus Ettl, et al.
WSC 2013
Mourad Baiou, Francisco Barahona
Algorithmica
Mourad Baiou, Francisco Barahona
Mathematical Programming