On the control of short-channel effect for MOSFETs with reverse halo implantation

Abstract

Reverse halo implantation (RHI), for the first time, is introduced and used to fabricate MOSFETs. It was demonstrated that RHI can dramatically improve short-channel effect, which can be used to enhance MOSFET performance, improve process control, or reduce stand-by power consumption. Implantation damage of RHI to gate oxide is negligible. The method of RHI is economic and suitable for massive manufacturing of very large scale integration. © 2007 IEEE.