PublicationJapanese Journal of Applied PhysicsPaperOn Al–SiO2interfaces and oxidation temperaturesJapanese Journal of Applied PhysicsView publicationAbstractNo abstract available.Home↳ PublicationsDate01 Jan 1980PublicationJapanese Journal of Applied PhysicsAuthorsM. Av-RonM. ShatzkesT.H. DistefanoR. GdulaIBM-affiliated at time of publicationShare