Conference paper
SOME BASIC PROBLEMS IN VLSI INTERCONNECT.
P.S. Ho
ECS Meeting 1984
Void formation during electromigration has been observed near the anode edge of a Cu-Al zone in an Al stripe. Growth of new voids was continuous with a void front propagating along the electron flow direction at a nonlinear rate. Such motion of the void front can be quantitatively correlated to the electromigration of Cu at grain boundaries. The measured displacements of the void front were analyzed to yield the grain-boundary diffusivity and effective charge for Cu electromigration.
P.S. Ho
ECS Meeting 1984
C.-K. Hu, M.B. Small, et al.
Applied Physics Letters
P.S. Ho, J.K. Howard
Journal of Applied Physics
J.K. Howard
JVSTA