NEW MATERIALS FOR HIGH RESOLUTION OPTICAL LITHOGRAPHY.

Abstract

The drive toward higher density circuitry in microelectronic devices has promoted interest in a variety of lithographic techniques designed to provide higher resolution than currently available. One such approach is the use of the shorter wavelength irradiation sources. New resist materials designed specifically to function efficiently in the mid UV (300-350 nm) and deep UV ( less than 290 nm) spectral regions are discussed. Since source intensity is often a problem at the shorter wavelengths, the phenomenon of chemical amplification is introduced and current polymeric materials showing this property are described.