Alvaro Padilla, Geoffrey W. Burr, et al.
IEEE T-ED
A nanomolding process for producing 55-nm-diameter magnetic islands over 3-cm-wide areas is described. A master pattern of SiO2 pillars is used to form a polymeric mold, which is in turn used to mold a photopolymer resist film. This latter film is used as a resist for etching SiO2, yielding a pattern of pillars. Finally, an 11-nm-CoPt multilayer is deposited. Magnetic force microscopy reveals that the film on top of each pillar is a magnetically isolated single domain that switches independently. © 2002 American Institute of Physics.
Alvaro Padilla, Geoffrey W. Burr, et al.
IEEE T-ED
Paul M. Ferm, Gary M. McClelland
The Journal of Chemical Physics
Qiu Dai, Yingyu Chen, et al.
Langmuir
C.Mathew Mate, Ragnar Erlandsson, et al.
Surface Science