Investigations of silicon nano-crystal floating gate memories
Arvind Kumar, Jeffrey J. Welser, et al.
MRS Spring 2000
In UV cure nanoimprint lithography the interfaces as well as the resist composition play an important role in determining the characteristics of the resulting patterned material, which can be used for subsequent pattern transfer, or be functional. It is important for applications that there be only rare defects, and that template release always be a clean process. In this paper fundamental physical and chemical aspects of the resist template interface are discussed, with a particular focus on how they influence the process of template removal. © 2008 CPST.
Arvind Kumar, Jeffrey J. Welser, et al.
MRS Spring 2000
S. Cohen, T.O. Sedgwick, et al.
MRS Proceedings 1983
Shaoning Yao, Wei-Tsu Tseng, et al.
ADMETA 2011
Michiel Sprik
Journal of Physics Condensed Matter