Compression for data archiving and backup revisited
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009
In UV cure nanoimprint lithography the interfaces as well as the resist composition play an important role in determining the characteristics of the resulting patterned material, which can be used for subsequent pattern transfer, or be functional. It is important for applications that there be only rare defects, and that template release always be a clean process. In this paper fundamental physical and chemical aspects of the resist template interface are discussed, with a particular focus on how they influence the process of template removal. © 2008 CPST.
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009
J.A. Barker, D. Henderson, et al.
Molecular Physics
Frank R. Libsch, Takatoshi Tsujimura
Active Matrix Liquid Crystal Displays Technology and Applications 1997
Mitsuru Ueda, Hideharu Mori, et al.
Journal of Polymer Science Part A: Polymer Chemistry