Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Systems of difference equations containing small parameters are studied by a constructive perturbation scheme analogous to the one developed by the authors for the study of differential equations. The method results in an averaging procedure for difference equations, and it is particularly well suited to certain highly oscillatory, nonlinear systems. The method is applied to problems from population genetics, pattern recognition, and the numerical analysis of stiff differential equations.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Alfred K. Wong, Antoinette F. Molless, et al.
SPIE Advanced Lithography 2000
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
F. Odeh, I. Tadjbakhsh
Archive for Rational Mechanics and Analysis