SPIE Advanced Lithography 2016
Conference paper

Modeling and parameter tuning for templated directed self-Assembly

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In this paper, we study the impact of topographic guide or template properties on pattern formation in a directed self-Assembly (DSA) process. In particular, we investigate the relationship between free energy and defect generation or process robustness, and analyze the influence of guide affinity. The good correlation between experimental and simulation results confirms the role of certain setup parameters and process conditions on the DSA patterning.