Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Se4N4 has been prepared in a new phase isostructural with S4N4. Its structure is reported together with the synthesis of two mixed sulfur-selenium-nitrogen compounds (SSe2N2+)2(X-)2 (X=CI, Br). The proposed structure of the latter compounds is based on mass spectroscopic, IR, and ESR data. The existence of these mixed sulfur-nitrogen-selenium compounds is of particular significance in view of the attempts to prepare (SeN)x, the analogue of superconducting (SN)x. © 1978, American Chemical Society. All rights reserved.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Thomas E. Karis, C. Mark Seymour, et al.
Rheologica Acta
P. Martensson, R.M. Feenstra
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Sung Ho Kim, Oun-Ho Park, et al.
Small