Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
No abstract available.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Frank R. Libsch, S.C. Lien
IBM J. Res. Dev
Liqun Chen, Matthias Enzmann, et al.
FC 2005
Gal Badishi, Idit Keidar, et al.
IEEE TDSC