Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
This paper is a review of recent progress in magnetic thin films for use in recording media and heads. Emphasis is on work that has been carried out at IBM. Topics covered include thin-film media for high-density recording, laminated soft-magnetic films for controlling domains and extending the frequency range of inductive heads, exchange-biasing of magnetoresistive sensors, and magnetic multilayer structures.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
M.F. Cowlishaw
IBM Systems Journal
David S. Kung
DAC 1998
M.J. Slattery, Joan L. Mitchell
IBM J. Res. Dev