Te-Ho Wu, Hong Fu, et al.
Journal of Applied Physics
A rapid thermal anneal for forming films of garnet phase deposited by sputtering is discussed in connection with magnetic, magneto-optical and optical properties. It was found the rapid thermal anneal kinetics in a temperature range from 620 to 680 °C involve a high activation energy for crystallization which is a diffusion controlled growth, whereas in a higher temperature range it has a relatively low activation energy. The controllability of the magnetic properties of Tcomp. as well as coercivity can be achieved through the rapid thermal annealing method. © 1990 IEEE
Te-Ho Wu, Hong Fu, et al.
Journal of Applied Physics
J.X. Shen, R.D. Kirby, et al.
Journal of Applied Physics
V.S. Speriosu, M.M. Chen, et al.
IEEE Transactions on Magnetics
T. Suzuki, S. Iwata, et al.
IEEE Transactions on Magnetics