Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
A theory of program-size complexity for something close to real LISP is sketched. © 1992.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Chai Wah Wu
Linear Algebra and Its Applications
Simeon Furrer, Dirk Dahlhaus
ISIT 2005