About cookies on this site Our websites require some cookies to function properly (required). In addition, other cookies may be used with your consent to analyze site usage, improve the user experience and for advertising. For more information, please review your options. By visiting our website, you agree to our processing of information as described in IBM’sprivacy statement. To provide a smooth navigation, your cookie preferences will be shared across the IBM web domains listed here.
Publication
Applied Optics
Paper
Line ratio and image formation in photolithographic projectors
Abstract
The line ratio and the ratio of the subresolution line image irradiance extremum normalized to the aberration-free case is explored as a means of assessing aberration balance and as a line-imaging criterion for a photolithographic projection system. © 1994 Optical Society of America.