Laser chemical vapor deposition of copper

F.A. Houle; C.R. Jones; T.H. Baum; C. Pico; C.A. Kovac

doi:10.1063/1.95685

Applied Physics Letters

Paper

01 Jan 1985

Laser chemical vapor deposition of copper

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Abstract

The first laser-induced deposition of copper has been demonstrated using a volatile copper coordination complex. The technique is characterized by reasonable rates and by the high quality of copper produced.

Paper

Surface processes leading to carbon contamination of photochemically deposited copper films

F.A. Houle, R.J. Wilson, et al.

JVSTA

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Liquid immersion deep-ultraviolet interferometric lithography

J. Hoffnagle, W.D. Hinsberg, et al.

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

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Gaseous products from the reaction of XeF₂ with silicon

Harold F. Winters, F.A. Houle

Journal of Applied Physics

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Summary Abstract: Desorption dynamics of SiF₄etch product

F.A. Houle

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

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Abstract

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