PublicationJournal of Vacuum Science and Technology A: Vacuum, Surfaces and FilmsPaperKinetics of high-temperature thermal decomposition of Si0 2 on Si(100)Journal of Vacuum Science and Technology A: Vacuum, Surfaces and FilmsView publicationAbstractNo abstract available.Home↳ PublicationsDate01 Jul 1987PublicationJournal of Vacuum Science and Technology A: Vacuum, Surfaces and FilmsAuthorsM. LiehrJ.E. LewisG.W. RubLoffIBM-affiliated at time of publicationTopicsPhysical SciencesMaterials DiscoveryShare
