About cookies on this site Our websites require some cookies to function properly (required). In addition, other cookies may be used with your consent to analyze site usage, improve the user experience and for advertising. For more information, please review your options. By visiting our website, you agree to our processing of information as described in IBM’sprivacy statement. To provide a smooth navigation, your cookie preferences will be shared across the IBM web domains listed here.
Publication
Applied Physics Letters
Paper
Ionic species in a silane plasma
Abstract
The abundances Aj of groups of higher silane ions Si jH+k were measured mass spectrometrically in an rf glow discharge in SiH4 under conditions used for preparation of hydrogenated amorphous silicon. The ratio Aj/Aj-1 is about 0.3 nearly independently of j, of pressure, of degree of ionization, and of rf power. The mean hydrogen to silicon ratio for j≥3 is 1.5±0.1 and pressure independent in the 0.017-0.100-Torr range. A mechanism postulating charge or hydride ion transfer and the addition of SiH4 as the most rapid reactions of silane ions is consistent with the observations.