O.F. Schirmer, W. Berlinger, et al.
Solid State Communications
We report a new method to fabricate electrode-embedded multiple nanopore structures with sub-10 nm diameter, which is designed for electrofluidic applications such as ionic field effect transistors. Our method involves patterning pore structures on membranes using e-beam lithography and shrinking the pore diameter by a self-limiting atomic layer deposition process. We demonstrate that 70∼80 nm diameter pores can be shrunk down to sub-10 nm diameter and that the ionic transport of KCl electrolyte can be efficiently manipulated by the embedded electrode within the membrane. © 2009 American Chemical Society.
O.F. Schirmer, W. Berlinger, et al.
Solid State Communications
B.A. Hutchins, T.N. Rhodin, et al.
Surface Science
Oliver Schilter, Alain Vaucher, et al.
Digital Discovery
Peter J. Price
Surface Science