Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
This issue of Algorithmica present papers on various aspects of nonlinear methods for solving linear programming problems, inspired by the work of Karmarkar. This introduction describes some of these aspects and briefly mentions other recent developments in the field. A bibliography of recent articles is included. © 1986 Springer-Verlag New York Inc.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
David Cash, Dennis Hofheinz, et al.
Journal of Cryptology
Charles Micchelli
Journal of Approximation Theory
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007