Conference paperAn analysis of the effects of miss clustering on the cost of a cache missThomas R. Puzak, A. Hartstein, et al.CF 2007
PaperAdvanced lithography kits: Serifs and hammerheadHang-Yip Liu, Steffen Schulze, et al.Proceedings of SPIE - The International Society for Optical Engineering
Conference paperPerformance data on new tunable attenuating PSM for 193nm and 157nm lithographyHans Becker, Frank Schmidt, et al.Photomask and Next-Generation Lithography Mask Technology 2004
