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The adhesion of diamondlike hard carbon films to silicide forming metals was improved by using an interfacial silicon film several atomic layers thick. The use of thicker (> 10 nm) silicon layers results in a decrease in the adhesion, probably due to a degradation of the structural integrity by excessive silicide formation. © 1988, Materials Research Society. All rights reserved.
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009
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