R.J. Gambino, N.R. Stemple, et al.
Journal of Physics and Chemistry of Solids
We report the first measurement of local structure in the thin layers of a semiconductor superlattice using the extended x-ray absorption fine structure. The measured values of interatomic distance and Debye-Waller factor in InAs offer a direct confirmation of the structure as intended in the growth process, and set an upper limit of the lattice strain to less than 1.5%. The data also indicate an anisotropy of the electron mean-free path in the thin layers and structural disorder at distances beyond the nearest neighbors. © 1985 The American Physical Society.
R.J. Gambino, N.R. Stemple, et al.
Journal of Physics and Chemistry of Solids
O.F. Schirmer, K.W. Blazey, et al.
Physical Review B
R.W. Gammon, E. Courtens, et al.
Physical Review B
Thomas E. Karis, C. Mark Seymour, et al.
Rheologica Acta