Investigations of silicon nano-crystal floating gate memories
Arvind Kumar, Jeffrey J. Welser, et al.
MRS Spring 2000
We report the first measurement of local structure in the thin layers of a semiconductor superlattice using the extended x-ray absorption fine structure. The measured values of interatomic distance and Debye-Waller factor in InAs offer a direct confirmation of the structure as intended in the growth process, and set an upper limit of the lattice strain to less than 1.5%. The data also indicate an anisotropy of the electron mean-free path in the thin layers and structural disorder at distances beyond the nearest neighbors. © 1985 The American Physical Society.
Arvind Kumar, Jeffrey J. Welser, et al.
MRS Spring 2000
David B. Mitzi
Journal of Materials Chemistry
H.D. Dulman, R.H. Pantell, et al.
Physical Review B
Michiel Sprik
Journal of Physics Condensed Matter