Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
A quick recognition of security hazards is challenging. Information sources are often insufficient to infer the occurrence of hazards with certainty, requiring recognition to be based on patterns of occurrences distributed over space and time. We introduce a generic framework that supports a quick response to changes in patterns of occurrences, using multiple inferencing techniques. We demonstrate, with a case study of detecting DoS attacks, that our approach is more flexible and accessible than custom-coded solutions, supporting multiple statistical Inferencing techniques when such results are available. © 2008 IEEE.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Alfonso P. Cardenas, Larry F. Bowman, et al.
ACM Annual Conference 1975
David A. Selby
IBM J. Res. Dev
Khalid Abdulla, Andrew Wirth, et al.
ICIAfS 2014